High-Purity Silicon Tetrafluoride (SiF4)

About the product

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is chosen for various types of etching and forming SiOF or optical fibers.

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四フッ化ケイ素(SiF4)

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Benefits

  • Proven sales track record with semiconductor makers.
  • High-quality technical support based on extensive marketing experience.

Characteristics

Technical Data

Appearance : colorless gas or liquid Odor : pungent odor
CAS NO. : 7783-61-1 UN number : 1859
Incombustible, corrosive gas Toxic
  • Please refer to the Safety Data Sheet  (SDS) for the gas’s detailed properties and safety data.

Physical & Chemical Properties of SiF4

Item Data
Physical state Gas
Appearance Liquefied gas
Color Colorless
Odor Characteristic odor (pungent odor)
pH Not applicable
Melting point -95.7 °C
Boiling point -65 °C (0.2 MPa)
Flash point Not applicable
Critical temperature -14.20 °C
Critical pressure 3.72 MPa
Relative vapor density (20 °C) 4.67 g/L (-1 °C)
Relative density 3.57 (air = 1, 15 °C)
Density 4.67 g/L (-1 °C)

CLP Information

  • Press. Gas (Comp.), H280
  • Acute Tox. 2, H330
  • Skin Corr. 1A, H314
  • Eye Dam. 1, H318

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