High-Purity Gas
Resonac offers high-purity gases for various uses and processes, including semiconductor wafer etching, film formation and cleaning. Resonac also provides reliable technical support based on its extensive marketing experience.
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Product List of High-Purity Gas
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Resonac’s high-purity gas used for cleaning film deposition chambers in semiconductor manufacturing and chosen mainly for 12-inch CVD equipment.
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Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is chosen for various types of etching and forming SiOF or optical fibers.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching oxide films and chosen for etching natural oxide films on the surface of silicon.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching organic films and chosen for etching carbon masks.
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Resonac’s gas used for forming conductor film in semiconductor manufacturing is particularly suitable for the deposition of silicon films and chosen for forming silicon channel films as well as cleaning.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching nitride films.
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Resonac’s high-purity gas used for cleaning film deposition chambers in semiconductor wafer production. Used mainly for 8-inch CVD equipment, FC-116 is also suitable for etching.
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Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon.
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Resonac’s high-purity gas used for the deposition of insulating films in semiconductor manufacturing, and particularly suitable for forming nitride films.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
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Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
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Resonac’s high-purity gas used for deposition of insulating films in semiconductor manufacturing, and particularly suitable for forming oxide films.
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Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon and chosen for forming TSVs (through-silicon vias).
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Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon and chosen for selective etching of leading-edge logic semiconductors.
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Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching metals and chosen for gate etching of leading-edge logic semiconductors.
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