High-Purity Gas

Resonac’s high-purity gas used for cleaning film deposition chambers in semiconductor manufacturing and chosen mainly for 12-inch CVD equipment.

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is chosen for various types of etching and forming SiOF or optical fibers.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching oxide films and chosen for etching natural oxide films on the surface of silicon.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching organic films and chosen for etching carbon masks.

Resonac’s gas used for forming conductor film in semiconductor manufacturing is particularly suitable for the deposition of silicon films and chosen for forming silicon channel films as well as cleaning.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching nitride films.

Resonac’s high-purity gas used for cleaning film deposition chambers in semiconductor wafer production. Used mainly for 8-inch CVD equipment, FC-116 is also suitable for etching.

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon.

Resonac’s high-purity gas used for the deposition of insulating films in semiconductor manufacturing, and particularly suitable for forming nitride films.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.

Resonac’s high-purity gas used for deposition of insulating films in semiconductor manufacturing, and particularly suitable for forming oxide films.

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon and chosen for forming TSVs (through-silicon vias).

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching polysilicon and chosen for selective etching of leading-edge logic semiconductors.

Resonac’s high-purity gas used for conductor etching in semiconductor manufacturing is particularly suitable for etching metals and chosen for gate etching of leading-edge logic semiconductors.