High-Purity Hydrogen Fluoride (HF)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing is particularly suitable for etching oxide films and chosen for etching natural oxide films on the surface of silicon.
Inquiry of this product
Merits
- A stable supply structure supported by a strong supply chain.
- Stable product quality with the technique for packaging corrosive gas.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
Appearance / colorless gas or liquid | Odor / pungent odor |
CAS NO / 7664-39-3 | UN number / 1052 |
Incombustible, corrosive gas | Toxic |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of HF
Item | Data |
---|---|
Physical state | Liquid |
Appearance | Liquid |
Color | Colorless |
Odor | Strong pungent odor |
Odor threshold (ppm) | 0.042ppm |
pH | Strong acid (pH of the 2% solution is 1 or lower) |
Melting point | -83.53 ℃ |
Boiling point | 19.51 ℃ |
Vapor pressure | 103.3 kPa (20℃) |
Relative vapor density (20℃) | 0.69 (air = 1, calculation value) |
Relative density | 0.987 (20℃) |
Inquiry of this product