High-Purity HFC-41 (CH3F)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching nitride films.
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Merits
- Used for etching various types of nitride films.
- Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain from multiple production sites.
- Relatively low global warming potential among HFC gases (GWP value = 92).
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance / colorless gas | Odor / odorless |
| CAS NO / 593-53-3 | UN number / 2454 |
| High-pressure gas | Combustible |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of CH３F
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Liquefied gas |
| Color | Colorless |
| Odor | Ether odor |
| pH | Not applicable |
| Melting point | -141.8 ℃ |
| Boiling point | -78.2 ～ -75.7 ℃ |
| Relative vapor density (20℃) | 1.20 (air=1) |
| Relative density | 0.88 - 1.20 （-78 ℃） |
| Solubility | Water: 0.228% (20℃, partial pressure 0.101 Mpa) |
| Explosive limits (vol %) | 6.8 - 20.3 vol % (in air) |
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