High-Purity FC-C318 (C4F8)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
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Merits
- Enables high-aspect-ratio etching.
- Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain from multiple production sites.
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance, odor / colorless odorless gas | UN number / 1976 |
| CAS NO／115-25-3 | Liquefied gas |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of C4F8
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Liquefied gas |
| Color | Colorless |
| pH | Not applicable |
| Melting point | -41 ℃ |
| Boiling point | -6 ℃ (101.3kPa) |
| Flash point | Incombustible |
| Critical temperature | 115.2 ℃ |
| Vapor pressure |
131kPa (0℃) 273kPa (21℃) |
| Critical pressure | 2.77 MPa |
| Relative vapor density (20℃) | 8.66g/L (21℃、101.3kPa) |
| Relative density | Gas: 7.33 (air=1、101.3kPa) |
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