High-Purity FC-2316 (C4F6)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
- ※ The sale and supply of products may not be available in certain countries or regions.
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Merits
- Enables high-aspect-ratio etching.
- Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain.
- Low global warming potential compared with other etching gases (GWP value ≦1).
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance, odor / colorless odorless gas | UN number / 3160 |
| CAS NO／685-63-2 | Liquefied gas |
- ※ Please refer to the Product Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of C4F6
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Clear and colorless |
| Color | Clear and colorless |
| pH | Not applicable |
| Melting point | -132.1 ℃ |
| Boiling point | 5.4 ℃ |
| Critical temperature | 139.6 ℃ |
| Autoignition point | 490 ℃ |
| Vapor pressure | 0.178 MPa(20 ℃) 0.473 MPa(50 ℃) |
| Relative vapor density(20 ℃) | 5.6（air = 1） |
| Relative density | 1.434 (20 ℃) / saturation |
| Explosive limits (upper, lower) (g/m³) | Lower limit: 5vol ％ Upper limit: 27 vol% (room temperature, 101.3kPa, in air)
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