High-Purity FC-2316 (C4F6)
About the product
Resonac’s high-purity gas used for etching insulating films in semiconductor manufacturing, and particularly suitable for etching oxide films.
- ※ The sale and supply of products may not be available in certain countries or regions.
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Benefits
- Enables high-aspect-ratio etching.
- Boasts one of the industry’s largest production volumes and a stable supply structure supported by a strong supply chain.
- Low global warming potential compared with other etching gases (GWP value ≤1).
- Proven sales track record with semiconductor makers.
- High-quality technical support based on extensive marketing experience.
Characteristics
Technical Data
| Appearance, odor : colorless odorless gas | UN number : 3160 |
| CAS NO. : 685-63-2 | Liquefied gas |
- ※ Please refer to the Safety Data Sheet (SDS) for the gas’s detailed properties and safety data.
Physical & Chemical Properties of C4F6
| Item | Data |
|---|---|
| Physical state | Gas |
| Appearance | Clear and colorless |
| Color | Clear and colorless |
| pH | Not applicable |
| Melting point | -132.1 °C |
| Boiling point | 5.4 °C |
| Critical temperature | 139.6 °C |
| Autoignition point | 490 °C |
| Vapor pressure | 0.178 MPa (20 °C) 0.473 MPa (50 °C) |
| Relative vapor density (20 °C) | 5.6 (air = 1) |
| Relative density | 1.434 (20 °C) / saturation |
| Explosive limits (upper, lower) (g/m³) | Lower limit: 5 vol % Upper limit: 27 vol % (room temperature, 101.3 kPa, in air)
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