Clean-S Treatment Type AF

Clean-S

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About the product

Features of Clean-S Type AF

Resonac’s Clean-S Treatment Type AF performs surface treatment that converts the surface layer of Clean-S treated films into nickel fluoride passive coatings by gas reaction using fluorine gas after conventional Clean-S treatment. Oxide and fluoride passive films are widely known for their superior corrosion resistance, but conventional technology has problems with the durability and longevity of passive coatings with extremely thin films (tens to thousands of Å).
Through a series of intensive studies and analyses to further improve corrosion resistance, Resonac has successfully developed technology to increase the thickness of nickel fluoride passive films on a micron level.

SEM断面写真

Cross-sectional SEM

Characteristics of AF (nickel fluoride passive film)

  1. 1 ) Forms an almost perfect NiF2, and film thickness can be freely adjusted up to 1 micron (under certain base material conditions).
  2. 2 ) Applicable to various types of stainless steel, iron and steel, copper and nickel alloy, and aluminium materials.
  3. 3 ) Provides coating strength and durability with a macro-Vickers hardness (Hmv) of 500 to 600.
  4. 4 ) Excellent corrosion resistance to fluorine gas and fluorine-based strong corrosive gases.
  5. 5 ) Outgassing amount: 1×10-9 Torr・L/S/cm2 at room temperature. 
    Can be used in a vacuum area with an outgassing amount of 9×10-12 Torr・L/S/cm2 after baking at 150℃ for 9 hours.
    (Torr・L/S/cm2 = 1.33×103Pa・m3/s/m2

AES depth profile 1

Clean-S Treatment Type AF

Analyzer: JEOL JAMP-10S
Measurement conditions: samples: Clean-S Treatment Type AF
Ar sputtering speed: 180Å/min.

Ar-ION SPUTTERING TIME

[Analysis]

  1. 1 ) When the time for detecting fluorine is 155 minutes, the thickness of fluoride film is calculated at about 2.8 microns in SiO2 equivalent. 
  2. 2 ) The elemental ratio of Ni to F is 1:2 and is estimated to form NiF2.
  3. 3 ) No oxygen is detected in the coatings, excluding adsorbed oxygen on the top surface, and no other impure elements are found. 

HCl resistance test results of Clean-S Treatment Type AF

クリーンエス処理の耐HCl特性

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