High-Purity Electronic-Grade Solvents

About the product

Resonac provides a wide range of high-purity solvents for semiconductor manufacturing processes.
The products serve various purposes, and are used for washing and rinsing and as a photoresist solvent.

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Merits

  • Available in various packaging modes from gallon bottles and canisters to ISO containers.
  • Accommodates the need for mixed solvents containing multiple organic solvents with specific compositions.
  • Guarantee is offered for the mother liquid (product tanks), filling aperture, and packaging mode (packaging of filled containers).
  • Solvents not in the list can also be provided with high purity in small amounts for laboratory use (test reagents) or pilot studies.

Product line-up

Category Product name Compound name CAS, product composition Usage
Carbon hydride Toluene Toluene 108-88-3 -
Xylene Xylene 1330-20-7 -
Alcohol Methanol Methanol 67-56-1 -

IPA

 Isopropyl alcohol 67-63-0 -
MIBC 4-Methyl-2-pentanol 108-11-2 -
Ketone Acetone 2-propanone 67-64-1 -
MEK Methyl ethyl ketone 78-93-3 -

MIBK

 Methyl isobutyl ketone 108-10-1 -
Cyclohexanone Cyclohexanone 108-94-1 -
Ether Diethyl ether Diethyl ether 60-29-7 -
Dibutyl ether Dibutyl ether 142-96-1 -
Cyclic ether

THF

 Tetrahydrofuran 109-99-9 -
1,4-Dioxane 1,4-Dioxane  123-91-1 -
Glycol ether PGME Propylene glycol monomethyl ether 107-98-2 -
PGMEA  Propylene glycol monomethyl ether acetate 108-65-6 -
Ester Ethyl acetate    Ethyl acetate 141-78-6 -
SOLFAINE-BA Butyl acetate 123-86-4 -
Ethyl lactate Ethyl lactate 687-47-8 -
Amide N,N-Dimethylformamide N,N-Dimethylformamide 68-12-2 -
Dimethylacetamide Dimethylacetamide 127-19-5 -
Other DMSO Dimethyl sulfoxide  67-68-5 -
γ-Butyrolactone γ-Butyrolactone 96-48-0 -
NMP N-Methyl-2-pyrrolidone 872-50-4 -
Mixed solvent SOLFINE-Rinse PX-1 Mixture of ester and glycol solvents - Thinner for semiconductor photoresist, edge/back rinsing solvent for lithography
SOLFINE-Rinse PX-7
 		 Mixture of PGME and PGMEA solvents - Edge/back rinsing solvent for semiconductor lithography, liquid crystal substrates, etc.
SOLFINE-Stripper 715D -

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 Stripping solvent to remove altered resist films (sidewall polymers) formed in the dry etching process of semiconductor photolithography. Also used for washing the parts of etching equipment.

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