Accelerating Customer Concept Validation:
What TOWA Expects from the Co-Creation Power of US-JOINT

2026/09/11

US-JOINT officially opened in Silicon Valley, California, on April 20, 2026 (local time). The consortium brings together 12 material and equipment suppliers from Japan and the United States to support concept validation for next-generation semiconductor packaging technologies.

What motivated companies to join the initiative? What value can US-JOINT provide to customers? One of the participating companies is TOWA Corporation, a leading provider of molding equipment used for semiconductor encapsulation. TOWA has established a strong position in semiconductor back-end processes through technology development guided by what it calls a “quarter-lead” approach—anticipating customer needs a quarter step ahead. We spoke with Mr. Muneo Miura, Director, President Executive Officer of TOWA, about his expectations for US-JOINT.

Why TOWA Joined US-JOINT: Accelerating Customer Concept Validation

What was the motivation behind TOWA's participation in US-JOINT?

Mr. Miura: One key reason was the need to adapt to changes in the semiconductor industry's value chain.

Before 2000, integrated device manufacturers (IDMs) typically handled semiconductor design, development, and manufacturing within a single organization. Product development cycles often took three to five years from concept to mass production.
The landscape began changing in the mid-2000s with the rapid growth of mobile devices, particularly smartphones. Fabless companies emerged, especially in North America, focusing on chip design and development while outsourcing manufacturing to foundries and OSAT (Outsourced Semiconductor Assembly and Test) providers. As a supplier of molding equipment for back-end processes, TOWA saw its primary customer interface shift toward OSAT companies.
This change also dramatically shortened development timelines. Activities that previously took several years increasingly had to be completed within months. In some cases, there simply was not enough time for thorough technical evaluation, resulting in missed business opportunities.

To address this challenge, TOWA established laboratories in Europe and North America and began providing prototype support free of charge, enabling direct engagement with fabless companies. Successful prototyping often led to production at OSAT facilities and, ultimately, equipment orders. These laboratories were positioned as strategic upfront investments.
Against this backdrop, the vision of US-JOINT shared by Hidenori Abe, who oversees semiconductor materials R&D at Resonac Holdings, resonated with me, and led me to decide to participate. US-JOINT brings together material and equipment suppliers with technologies essential for next-generation semiconductor packaging at a single location in Silicon Valley. As a result, customers such as fabless firms and hyperscalers no longer need to visit multiple supplier laboratories when evaluating packaging concepts. This represents a significant advantage, enabling faster and more efficient concept validation.
In addition, semiconductor manufacturing activity is increasingly expanding within the United States. We believe it is highly valuable to use US-JOINT as a platform from which participating companies can proactively engage customers and explore new opportunities together.

How do you expect participation in the consortium to change relationships with customers?

Mr. Miura: We expect relationships with fabless companies and hyperscalers to become even more mutually beneficial. Through direct discussions at US-JOINT, we can gain a clearer understanding of customers’ objectives and technical priorities. At the same time, customers can gain early access to ideas for improvement that material and equipment suppliers are uniquely positioned to offer and incorporate those insights into their design and development activities.

For an equipment manufacturer such as TOWA, product quality and productivity are fundamental expectations. Ultimately, customers also expect us to help reduce manufacturing costs at commercial production scale. Direct engagement enables us to propose solutions that contribute directly to those goals.

Mr. Muneo Miura,
Director, President Executive Officer of TOWA

What kind of interaction is taking place among participating companies, and what synergies do you hope to see going forward?

Mr. Miura: While this is the first time we have collaborated through the US-JOINT framework, many participants have known each other through business activities in Japan. Personally, my interaction has so far been limited to meeting participants during the opening ceremony, so deeper engagement is still ahead.

However, TOWA engineers are already working on site, and interaction among engineers has begun. New relationships are forming with companies that previously had little direct contact, and relationships among engineers are steadily growing. I expect communication among consortium members and customers to become increasingly active.

Rather than optimizing only their individual process steps, participating companies can share knowledge and technologies across process boundaries and evaluate solutions from the perspective of the entire package. This collaborative approach has the potential to create new relationships, generate fresh ideas, and lead to innovative technical proposals.

Addressing AI-Era Challenges Through Materials, Equipment, and Processes

What trends in advanced semiconductor packaging are you paying the closest attention to?

Mr. Miura: Today, AI is the primary force driving the semiconductor industry, and I expect that trend to continue for some time.

Initially, demand was concentrated in AI servers, but growth has expanded into PCs and mobile devices, and physical AI applications such as autonomous vehicles and robotics are beginning to emerge. Compared with the era when mobile devices were the main demand driver, overall demand feels several times larger.

What challenges do these trends create, and how is TOWA addressing them?

Mr. Miura: Thermal management remains a significant technical challenge. For AI-oriented semiconductor packages, TOWA has proposed a technology called Molded Underfill (MUF). Using compression molding under vacuum conditions, MUF fills and seals gaps inside the package with resin in a single process. In addition to simplifying manufacturing and improving productivity, the integrated molding structure has demonstrated effectiveness in improving heat dissipation.

Another area is improving cost efficiency through larger panel sizes. As panel dimensions increase, more chips can be processed in a single molding cycle, reducing cost per unit. Equipment capable of handling 600 mm-class panels is already commercially available, and the industry has begun discussing the next generation of 700 mm-class panels.

We are also focusing on substrate flatness. Traditionally, substrates have been produced using lamination processes. As multilayer substrates and embedded-substrate technologies become more prevalent, flatness will become increasingly critical. Leveraging precision press technologies developed through our ultra-high-precision mold expertise, we can achieve micron-level flatness even on 600 mm-class substrates. We see strong potential for applying this capability to next-generation substrate manufacturing.

Model CPM 1180

From an equipment manufacturer’s perspective, what is the value of working closely with material suppliers?

Mr. Miura: The greatest benefit is the ability to identify and solve problems together during prototyping and preparation for mass production.

Using a cooking analogy, equipment manufacturers provide the cooking tools, material suppliers provide the ingredients, and customers prepare the meal. When a problem occurs, determining whether the cause lies in the equipment, the materials, or the process conditions is rarely straightforward for any one company alone.

Within US-JOINT, equipment suppliers, material suppliers, and customers can share challenges in the same environment and work together to validate solutions. Rather than debating where responsibility lies, participants can jointly analyze root causes and identify the most effective solution, accelerating problem resolution.

One example of the benefits of collaboration is the possibility of eliminating entire process steps. Because equipment and materials can be evaluated together, activities that were previously separated may be consolidated into a single process. Reducing process steps can lower capital investment, material consumption, and labor time, resulting in improved overall cost efficiency.

Start by Sharing Your Challenges: Co-Creation Through US-JOINT

Finally, what message would you like to share with customers?

Mr. Miura: TOWA supports customers around the world in the development and manufacturing of a wide range of semiconductor packages. Through US-JOINT, we would like to engage with any customer facing technical challenges, regardless of whether they have previous experience working with us. Even if the topic is highly complex, we encourage customers to start by discussing the challenge with us. Together, we can consider how US-JOINT may be used to evaluate potential solutions.
The larger the challenge, the greater the potential impact when it is solved. At the same time, tackling difficult problems helps participating companies strengthen their technologies and grow their businesses. That is why we welcome discussions even when a clear solution has not yet emerged.

Over many years, TOWA has accumulated extensive experience and data through prototyping activities around the world. Technologies that may not have reached commercialization at one point often find application years later in different products or processes. By drawing on this broad base of knowledge and experience, we look forward to working with customers to solve challenging problems together.

Profile

Director, President Executive Officer, TOWA Corporation

Muneo Miura joined TOWA Corporation in 1990 and began his career in the design and development of molding dies for semiconductor back-end manufacturing processes.

He later relocated to Singapore as a member of the team responsible for establishing the company’s local operations, contributing to the foundation of TOWA’s international business development. After returning to Japan, he led the creation of a global laboratory framework aimed at addressing customers’ technical challenges from the early stages of product development. He subsequently held a number of leadership positions, including Head of Sales Engineering, Head of Global Sales, and General Manager of the Sales Division.

In 2025, he was appointed Director, President Executive Officer. In his current role, he is responsible for advancing the sustainable growth of the TOWA Group and enhancing its corporate value.

TOWA Corporation HP https://www.towajapan.co.jp/en/新規ウィンドウで開く

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Muneo Miura

 

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